HEA|  |01455nam  2200373   4500
001|  |021998012022
003|  |CAL
005|  |20050608112137.0
008|  |900817s1990    njua     b    10110 eng
010|  |▼a   90084188
037|  |▼a7161089▼bph▼c35.00
040|  |▼aDLC▼cDLC
050|00|▼aTK7871.85▼b.S974 1990
082|00|▼a621.381/52▼220
093|  |▼aTL62-53▼23
099|  |▼aCAL 022000222048
111|2 |▼aSymposium on Plasma Processi-
   |  |ng▼n(8th :▼d1990 :▼cMontr?eal, Qu?ebec)
245|00|▼aProceedings of the Eighth Sy-
   |  |mposium on Plasma Processing /-
   |  |▼cedited by G.S. Mathad and D.W. Hess.
260|  |▼aPennington, NJ :▼bElectroche-
   |  |mical Society,▼cc1990.
300|  |▼axi, 787 p. :▼bill. ;▼c23 cm.
490|0 |▼aProceedings / The Electroche-
   |  |mical Society ;▼vv. 90-14
500|  |▼a"Dielectric Science and Tech-
   |  |nology and Electronics divisions."
504|  |▼aIncludes bibliographical ref-
   |  |erences and indexes.
650| 0|▼aSemiconductors▼xEtching▼xCongresses.
650| 0|▼aPlasma etching▼xCongresses.
700|1 |▼aMathad, G. S.
700|1 |▼aHess, Dennis W.
710|2 |▼aElectrochemical Society.▼bDi-
   |  |electric Science and Technolog-
   |  |y Division.
710|2 |▼aElectrochemical Society.▼bEl-
   |  |ectronics Division.
740|01|▼aPlasma processing.
830| 0|▼aProceedings (Electrochemical-
   |  | Society) ;▼vv. 90-14.
950|  |▼awhutl▼f53.815083/P963
998|  |▼aPUL
999|  |▼tC▼Atshs25▼a20050608 11:20:39-
   |  |▼Mtshs25▼m20050608 11:21:37▼Gt-
   |  |shs25▼g20050608 11:21:57

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