名称: | |
描述: | |
公开/私有: | 公开 私有 |
Semiconductor microlithography V / |
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ISBN/ISSN:
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089252250X (pbk.) |
中图分类法
:
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TN405-53 |
题名:
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Semiconductor microlithography V / |
出版发行:
|
Bellingham, Wash. : SPIE, 1980. |
载体形态:
|
viii, 240 p. : ill. ; 28 cm. |
主题词:
|
Semiconductors Congresses. |
主题词:
|
Microlithography Congresses. |
主要责任者:
|
Dey, Jim. |
标签:
|
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相关资源:
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分享资源:
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HEA| |01508nam 2200337 i 4500 001| |021997013358 003| |CAL 005| |20050602105246.0 008| |801217s1980 waua b 10100 eng 010| |▼a 80050727 //r852 020| |▼a089252250X (pbk.) 035| |▼aW102815-16 wl 040| |▼cSJT 050|00|▼aTK7871.85▼b.S465 082|00|▼a621.381/71▼219 093| |▼aTN405-53▼23 245|00|▼aSemiconductor microlithograp- | |hy V /▼cJim Dey, editor ; pres- | |ented by the Society of Photo-- | |optical Instrumentation Engine- | |ers in cooperation with the No- | |rthern California Microphotoma- | |sk/Masking Working Group and t- | |he International Society for H- | |ybrid Microelectronics, March - | |17-18, 1980, San Jose, California. 260| |▼aBellingham, Wash. :▼bSPIE,▼c1980. 300| |▼aviii, 240 p. :▼bill. ;▼c28 cm. 490|1 |▼aProceedings of the Society o- | |f Photo-optical Instrumentatio- | |n Engineers ;▼vv. 221 504| |▼aIncludes bibliographical ref- | |erences and indexes. 650| 0|▼aSemiconductors▼xCongresses. 650| 0|▼aMicrolithography▼xCongresses. 700|1 |▼aDey, Jim. 710|2 |▼aSociety of Photo-optical Ins- | |trumentation Engineers. 710|2 |▼aNorthern California Micropho- | |tomask/Masking Working Group. 710|2 |▼aInternational Society for Hy- | |brid Microelectronics. 830| 0|▼aProceedings of the Society o- | |f Photo-optical Instrumentatio- | |n Engineers ;▼vv. 221. 950| |▼aJ▼fTS82-53/S678 998| |▼aSJT 999| |▼tC▼Atshs14▼a20050602 10:51:35- | |▼Mtshs14▼m20050602 10:52:46▼Gt- | |shs14▼g20050602 10:53:00