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Semiconductor microlithography V /

ISBN/ISSN:
089252250X (pbk.)
中图分类法 :
TN405-53
题名:
Semiconductor microlithography V /
出版发行:
Bellingham, Wash. : SPIE, 1980.
载体形态:
viii, 240 p. : ill. ; 28 cm.
主题词:
Semiconductors Congresses.
主题词:
Microlithography Congresses.
主要责任者:
Dey, Jim.
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限定所在馆: 限定所在馆藏地点: 限定馆藏状态:
HEA|  |01508nam  2200337 i 4500
001|  |021997013358
003|  |CAL
005|  |20050602105246.0
008|  |801217s1980    waua     b    10100 eng
010|  |▼a   80050727 //r852
020|  |▼a089252250X (pbk.)
035|  |▼aW102815-16 wl
040|  |▼cSJT
050|00|▼aTK7871.85▼b.S465
082|00|▼a621.381/71▼219
093|  |▼aTN405-53▼23
245|00|▼aSemiconductor microlithograp-
   |  |hy V /▼cJim Dey, editor ; pres-
   |  |ented by the Society of Photo--
   |  |optical Instrumentation Engine-
   |  |ers in cooperation with the No-
   |  |rthern California Microphotoma-
   |  |sk/Masking Working Group and t-
   |  |he International Society for H-
   |  |ybrid Microelectronics, March -
   |  |17-18, 1980, San Jose, California.
260|  |▼aBellingham, Wash. :▼bSPIE,▼c1980.
300|  |▼aviii, 240 p. :▼bill. ;▼c28 cm.
490|1 |▼aProceedings of the Society o-
   |  |f Photo-optical Instrumentatio-
   |  |n Engineers ;▼vv. 221
504|  |▼aIncludes bibliographical ref-
   |  |erences and indexes.
650| 0|▼aSemiconductors▼xCongresses.
650| 0|▼aMicrolithography▼xCongresses.
700|1 |▼aDey, Jim.
710|2 |▼aSociety of Photo-optical Ins-
   |  |trumentation Engineers.
710|2 |▼aNorthern California Micropho-
   |  |tomask/Masking Working Group.
710|2 |▼aInternational Society for Hy-
   |  |brid Microelectronics.
830| 0|▼aProceedings of the Society o-
   |  |f Photo-optical Instrumentatio-
   |  |n Engineers ;▼vv. 221.
950|  |▼aJ▼fTS82-53/S678
998|  |▼aSJT
999|  |▼tC▼Atshs14▼a20050602 10:51:35-
   |  |▼Mtshs14▼m20050602 10:52:46▼Gt-
   |  |shs14▼g20050602 10:53:00
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