名称: | |
描述: | |
公开/私有: | 公开 私有 |
Vacuum deposition of thin films / |
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中图分类法
:
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TG174.444 |
著者:
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Holland, L. |
题名:
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Vacuum deposition of thin films / |
出版发行:
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London : Chapman & Hall, 1956. |
载体形态:
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xix, 541 p., [25] p. of plates : ill. ; 23 cm. |
主题词:
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Vapor-plating. |
标签:
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相关主题:
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分享资源:
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HEA| |00719nam 2200229 a 4500 001| |021996013515 003| |CAL 005| |20050427114415.0 008| |861027s1956 enkaf 000 0 eng 040| |▼aSCG▼cSCG▼dUKM▼dCIN 082|04|▼a660.2842▼218 093| |▼aTG174.444▼24 094| |▼a77.82▼22 099| |▼aCAL 022003113954 100|1 |▼aHolland, L. 245|10|▼aVacuum deposition of thin fi- | |lms /▼cL. Holland ; with a for- | |eward by S. Tolansky. 260| |▼aLondon :▼bChapman & Hall,▼c1956. 300| |▼axix, 541 p., [25] p. of plat- | |es :▼bill. ;▼c23 cm. 650| 0|▼aVapor-plating. 950| |▼awg▼f53.0575/H735 998| |▼aNMU 999| |▼tC▼Atshs07▼a20050427 11:43:49- | |▼Mtshs07▼m20050427 11:44:15▼Gt- | |shs07▼g20050427 11:44:34